Our resist system can pattern a variety of conducting polymer materials, while maintaining the high conductivities needed for your application.

We can pattern fine lines in PEDOT:PSS down to a few microns for applications in OTFTs or larger sizes for touch screens.

The resist can be stripped at the end of the process leaving a clean interface for further processing.

Product Features

  • Compatibility
    • Etch and liftoff capable
    • Small molecule and polymer
    • Solution and vacuum processed
  • Performance
    • i-line or DUV sensitivity
    • Standard photolithography process steps
    • Sub-micron resolution
    • Controllable thickness
  • Green
    • Low greenhouse gas
    • No ozone depletion
    • Recyclable solvents

Get Started