Orthogonal photolithography vs. Solution Printing

Film Quality: A profound benefit of Orthogonal’s photolithographic process is the high quality of the films after patterning. Spin-coated or slot die coated films are significantly more uniform compared to printing which often times suffer to the coffee-ring effect. Orthogonal’s photoresists can pattern a wide range of organic thin films leaving a perfectly uniform, high performance film, without reformulation.

Resolution: Photolithography is capable of high resolution patterning on a variety of substrate materials. Orthogonal’s resists pattern down to a half of a micron on an i-line lithography tool as well as 2 μm on flexible substrates. Critical dimensions will not be the source of yield problems.

Registration: Orthogonal’s process takes advantage of the high degree of accuracy of modern photolithography systems. Overlays well below 0.1 μm are routinely achievable, and this can enable more complex devices with multiple functional levels that require alignment.

Orthogonal resists can pattern down to 30 nanometers